M.W. |
20 |
Formula |
HF |
Chemical Composition% |
|||||||||
Item |
HF% ≥ |
Residue on ignition (In terms of sulfate) |
Chloride (Cl) |
Sulfates and Sulphites |
(in terms of SO4) |
Phosphate (in terms of PO4) |
Fluorosilicate |
Iron (Fe) |
Heavy Metals (in terms of Pb) |
Maximum |
|||||||||
Index |
40 |
0.01 |
0.005 |
0.005 |
0.005 |
0.0005 |
0.06 |
0.0005 |
0.001 |
Due to its ability to dissolve oxides, hydrofluoric acid plays an important role in the purification of aluminum and uranium. Hydrofluoric acid is also used to etch glass, to remove oxides from the surface of silicon in the semiconductor industry. It can be used as a catalyst for the alkylation of isobutane and butane in oil refineries. Hydrofluoric acid is also used in the "dipping" process to remove oxygen-containing impurities from the surface of stainless steel. Furthermore, it is also used in the synthesis of a variety of fluorinated organics, such as Teflon (polytetrafluoroethylene) and refrigerants such as freon.